发明名称 LOW-TEMPERATURE CURABLE PHOTOSENSITIVE COMPOSITION
摘要 <P>PROBLEM TO BE SOLVED: To provide low-temperature curable photosensitive compositions which are made flexible materials. <P>SOLUTION: The low-temperature curable photosensitive compositions containing a polyamic acid are developable in aqueous alkaline solutions and are curable at a temperature of at least 160&deg;C and up to 200&deg;C, to low modulus polyimides suitable for use in electronic circuit applications, and which are particularly suitable for use in flexible circuit applications where low curl, low temperature curing, and good adhesion is a significant advantage. <P>COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006146244(A) 申请公布日期 2006.06.08
申请号 JP20050339134 申请日期 2005.11.24
申请人 E I DU PONT DE NEMOURS & CO 发明人 DUEBER THOMAS E;WEST MICHAEL W J;KANAKARAJAN KUPPSUAMY;AUMAN BRIAN C
分类号 G03F7/037;C08G73/10;G03F7/004;G03F7/027 主分类号 G03F7/037
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