摘要 |
The invention relates to a method for producing tetrafluorosilane by decomposing hexafluorosilicic acid with sulfuric acid, which comprises: step 1 of decomposing hexafluorosilicic acid in concentrated sulfuric acid in the first reactor to give SiF<SUB>4 </SUB>and HF and taking out the SiF<SUB>4</SUB>; step 2 of transferring part of the concentrated sulfuric acid solution of step 1 containing HF into the second reactor to react the HF with silicon dioxide fed thereinto, thereby producing SiF<SUB>4 </SUB>containing (SiF<SUB>3</SUB>)<SUB>2</SUB>O; and step 3 of bringing the reaction product of step 2 containing (SiF<SUB>3</SUB>)<SUB>2</SUB>O and SiF<SUB>4 </SUB>to the first reactor to react (SiF<SUB>3</SUB>)<SUB>2</SUB>O contained in the reactin product with HF to convert it into SiF<SUB>4 </SUB>and then taking out the SiF<SUB>4 </SUB>along with SiF<SUB>4 </SUB>formed in step 1. According to the invention, high-purity SiF<SUB>4 </SUB>can be obtained with (SiF<SUB>3</SUB>)<SUB>2</SUB>O being reduced, free from HF generated as a problematic side product in conventional method. |