| 摘要 |
PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition which maintains a sufficient transparency, solvent resistance and adhesion and is provided with a required resolving power and storage stability even when it is submitted to a high-temperature treatment after formation of a pattern of an inter-laminar insulating film or a microlens, and an interlaminar insulating film and a microlens prepared therefrom. SOLUTION: The radiation-sensitive resin composition comprises [A] a polymer containing a phenolic hydroxyl group and/or a carboxyl group and [B] at least one compound selected from the group consisting of a 1,2- quinonediazide-6-sulfonate ester compound, a 1,2-quinonediazide-7-sulfonic ester compound and a 1,2-quinonediazide-8-sulfonic ester compound. The inter-laminar insulating film and the microlens are prepared from the above composition. |
