发明名称 Method for surface treatment
摘要 A method for surface treatment includes: a first step in which a surface treatment apparatus 1 and a substrate 10 in a state where a front surface 102 of the substrate 10 faces the surface treatment apparatus 1 are conveyed to the inside of a decompression chamber to decompress a plurality of concave portions 32 (enclosed spaces); a second step in which the surface treatment apparatus 1 and the substrate 10 are brought out from the inside of the decompression chamber to environment under atmospheric pressure in a state where the substrate 10 is being attracted to the surface treatment apparatus 1 with the use of a difference between negative pressure inside the concave portions 32 and atmospheric pressure; and a third step in which the surface treatment is carried out to a back surface 101 of the substrate 10 with the substrate 10 being attracted by the surface treatment apparatus 1.
申请公布号 EP1521294(A3) 申请公布日期 2006.06.07
申请号 EP20040023294 申请日期 2004.09.30
申请人 SEIKO EPSON CORPORATION 发明人 KOEDA, HIROSHI;ARAKAWA, KATSUJI;OYA, KAZUFUMI
分类号 C23F1/08;H01L21/00;H01L21/02;H01L21/306;H01L21/683 主分类号 C23F1/08
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