发明名称 |
Method for surface treatment |
摘要 |
A method for surface treatment includes: a first step in which a surface treatment apparatus 1 and a substrate 10 in a state where a front surface 102 of the substrate 10 faces the surface treatment apparatus 1 are conveyed to the inside of a decompression chamber to decompress a plurality of concave portions 32 (enclosed spaces); a second step in which the surface treatment apparatus 1 and the substrate 10 are brought out from the inside of the decompression chamber to environment under atmospheric pressure in a state where the substrate 10 is being attracted to the surface treatment apparatus 1 with the use of a difference between negative pressure inside the concave portions 32 and atmospheric pressure; and a third step in which the surface treatment is carried out to a back surface 101 of the substrate 10 with the substrate 10 being attracted by the surface treatment apparatus 1. |
申请公布号 |
EP1521294(A3) |
申请公布日期 |
2006.06.07 |
申请号 |
EP20040023294 |
申请日期 |
2004.09.30 |
申请人 |
SEIKO EPSON CORPORATION |
发明人 |
KOEDA, HIROSHI;ARAKAWA, KATSUJI;OYA, KAZUFUMI |
分类号 |
C23F1/08;H01L21/00;H01L21/02;H01L21/306;H01L21/683 |
主分类号 |
C23F1/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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