发明名称 Flash memory cell, flash memory cell array and manufacturing method thereof
摘要 A flash memory cell array comprises a substrate, a string of memory cell structures and source region/drain region. Each of memory cell structures includes a stack gate structure including a select gate dielectric layer, a select gate and a gate cap layer formed on the substrate; a spacer is set on the sidewall of the select gate; a control gate connected to the stack gate structure is set on the one side of the stack gate structure; a floating gate is set between the control gate and the substrate; an inter-gate dielectric layer is set between the control gate and the floating gate; and a tunneling dielectric layer is set between the floating gate and the substrate. The source region/drain region is set in the substrate near outer control gate and stack gate structure of the flash memory cell array.
申请公布号 US7057940(B2) 申请公布日期 2006.06.06
申请号 US20050907830 申请日期 2005.04.18
申请人 POWERCHIP SEMICONDUCTOR CORP. 发明人 HSU CHENG-YUAN;HUNG CHIH-WEI;WU CHI-SHAN;HUANG MIN-SAN
分类号 G11C16/04;G11C13/00;H01L21/8247;H01L27/115 主分类号 G11C16/04
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