发明名称 Forming a cap above a metal layer
摘要 In one embodiment, the present invention includes an apparatus having a metal layer with a pad disposed above a substrate; and a cap disposed above the metal layer having a first portion to provide for contact with a probe and a second portion to provide a bonding surface, and the cap is electrically coupled to the pad.
申请公布号 US7056817(B2) 申请公布日期 2006.06.06
申请号 US20020300253 申请日期 2002.11.20
申请人 INTEL CORPORATION 发明人 SESHAN KRISHNA;JENG KEVIN;DUN HAIPING
分类号 H01L21/44;H01L23/485 主分类号 H01L21/44
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