发明名称 Projection optical system, exposure apparatus and device fabrication method
摘要 A projection optical system includes a first optical element that orients an axis [1 1 1] as a crystal orientation in a cubic system crystal parallel to an optical axis, and a second optical element that orients an axis [1 0 0] as the crystal orientation in the cubic system crystal so that a minimum angle may be 30° or larger between the optical axis and an off-axis edge beam that passes through the second optical element, and a minimum angle may be 10° or smaller between the optical axis and an off-axis principal ray that passes through the second optical element.
申请公布号 US7057708(B2) 申请公布日期 2006.06.06
申请号 US20040016420 申请日期 2004.12.17
申请人 CANON KABUSHIKI KAISHA 发明人 YAMADA AKIHIRO
分类号 G02B13/24;G03B27/54;G02B1/02;G02F1/07;G03B27/32;G03B27/42;G03F7/20;H01L21/027 主分类号 G02B13/24
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