发明名称 Semiconductor support for microelectronics comprises graphite substrate with layers of monocrystalline diamond, insulating oxide and semiconducting material
摘要 The support (1) consists of a rectangular substrate (5) of graphite with front (6) and rear (7) faces, and at least one front face stack comprising a layer of monocrystalline diamond (8a), a layer of an electrically insulating oxide (9a) and a semiconducting layer (2a). A second stack of the same materials (8b, 9b, 2b) and an optional layer of a polymer material can be applied to the rear face of the substrate. The oxide layer contains at least one of the following: Al2O3, BaSrTiO3. HfO2 and rare earth oxides. The support is also fitted with electrical (3) and thermal (11) connections.
申请公布号 FR2878648(A1) 申请公布日期 2006.06.02
申请号 FR20040012699 申请日期 2004.11.30
申请人 COMMISSARIAT A L'ENERGIE ATOMIQUE ETABLISSEMENT PUBLIC A CARACTERE SCIENTIFIQUE TECHNIQUE ET INDUSTRIEL 发明人 DELEONIBUS SIMON
分类号 H01L23/14;H01L21/84;H01L23/373 主分类号 H01L23/14
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