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发明名称
高度选择性矽氧化物蚀刻组合物
摘要
本发明揭示一种矽氧化物蚀刻溶液,其包含至少一种溶解于由至少一种羧酸所组成之溶剂内之双氟化物源化合物之产物,且进一步包含约0.5至约3溶液重量%氢氟酸及约1至约5溶液重量%水,其中双氟化物源化合物之全部浓度为每公斤溶剂约1.25与约5.0莫耳之间。本发明亦揭示自金属表面选择性移除矽氧化物与金属矽酸盐之方法。
申请公布号
TW200617147
申请公布日期
2006.06.01
申请号
TW094110737
申请日期
2005.04.04
申请人
哈尼威尔国际公司
发明人
约翰A 马克法兰;沃夫甘 赛维特;麦可A 都德
分类号
C09K13/08;H01L21/311
主分类号
C09K13/08
代理机构
代理人
陈长文
主权项
地址
美国
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