| 摘要 |
<p>A process for preparing a compound of formula (I) X-(CH<SUB>2</SUB>)<SUB>n</SUB>-ONO<SUB>2</SUB> (I) wherein: X is a halogen atom selected from Cl, Br, I; n is an integer from 3 to 6; said process comprising the slow addition of a compound of formula (II) X-(CH<SUB>2</SUB>)<SUB>n</SUB>-OH (II) wherein X and n are as defined above to a nitrating agent selected from the group consisting of concentrated nitric acid/concentrated sulfuric acid (sulfonitric mixture), nitric acid alone, NaNO<SUB>2</SUB> in trifluoroacetic acid, nitronium salts such as NO<SUB>2</SUB>BF<SUB>4</SUB> and an organic solvent selected from the group consisting of CH<SUB>2</SUB>Cl<SUB>2</SUB>, CHCl<SUB>3</SUB>, CCl<SUB>4</SUB>, perfluorohexane, perfluoroheptane. The invention refers also to solutions containing: a compound of general formula (I) and a solvent selected from the group consisting of CH<SUB>2</SUB>Cl<SUB>2</SUB>, CHCl<SUB>3</SUB>, CCl<SUB>4</SUB>, perfluorohexane, perfluoroheptane, characterized in that the compound of formula (I) is present in a concentration not higher than 20% by weight.</p> |
