| 发明名称 |
PROCESS FOR PRODUCING FILM FORMING RESIN FOR PHOTORESIST COMPOSITION |
| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a method for reducing a metal contained in a solution of a film forming resin, and a filter sheet for use in said method. <P>SOLUTION: This filter sheet is for the filtration of a photoresist composition containing a self-supporting fiber matrix with a functionalized silica gel immobilized therein. The functionalized silica gel is substantially evenly distributed on the cross-section of the matrix. <P>COPYRIGHT: (C)2006,JPO&NCIPI</p> |
| 申请公布号 |
JP2006136883(A) |
申请公布日期 |
2006.06.01 |
| 申请号 |
JP20050326990 |
申请日期 |
2005.11.11 |
| 申请人 |
AZ ELECTRONIC MATERIALS USA CORP |
发明人 |
PADMANABAN MUNIRATHNA;RAHMAN M DALIL |
| 分类号 |
B01D39/14;B01D39/16;G03F7/26 |
主分类号 |
B01D39/14 |
| 代理机构 |
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