SEMICONDUCTOR MICROFABRICATED STRUCTURE AND ITS MANUFACTURING METHOD

摘要

PROBLEM TO BE SOLVED: To provide a method of manufacturing a microfabricated structure which has a reduced crystalline defect level and has superior semiconductor characteristics. SOLUTION: The method of manufacturing the microfabricated structure formed of a single crystal semiconductor comprises a process (a) wherein first catalyst fine particles 130 containing a first dopant element to be grown as a first conductivity type for the single crystal semiconductor are formed on a support body 101; and a process (b) wherein a material gas containing an element constituting the single crystal semiconductor is introduced near the surface of the support body, the material gas is decomposed by the first catalyst fine particles, and then a single crystal semiconductor containing the first dopant element is so grown as to form a first microfabricated object 111. COPYRIGHT: (C)2006,JPO&NCIPI