发明名称 |
Calibration of X-ray reflectometry system |
摘要 |
A method for inspection of a sample includes irradiating the sample with a beam of X-rays and measuring a distribution of the X-rays that are emitted from the sample responsively to the beam, thereby generating an X-ray spectrum. An assessment is made of an effect on the spectrum of a non-uniformity of the beam, and the spectrum is corrected responsively to the effect.
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申请公布号 |
US2006115046(A1) |
申请公布日期 |
2006.06.01 |
申请号 |
US20040000044 |
申请日期 |
2004.12.01 |
申请人 |
BERMAN DAVID;PELED ASHER;AGNIHOTRI DILEEP;RAFAELI TACHI;YOKHIN BORIS |
发明人 |
BERMAN DAVID;PELED ASHER;AGNIHOTRI DILEEP;RAFAELI TACHI;YOKHIN BORIS |
分类号 |
G01N23/20 |
主分类号 |
G01N23/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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