发明名称 APPARATUS AND METHOD FOR MEASURING THICKNESS AND PROFILE OF TRANSPARENT THIN FILM USING WHITE-LIGHT INTERFEROMETER
摘要 PROBLEM TO BE SOLVED: To provide an apparatus and method for measuring the thickness and profile of a transparent film using a white-light interferometer, capable of simultaneously measuring the thickness and surface profile of the transparent thin film. SOLUTION: In this method, after coherent light is separated according to frequency, a first interference fringe at each frequency is obtained, and after composite coherent light is separated according to frequency, a second interference fringe at each frequency is obtained. Further, a phase generated by the thickness of the thin film is obtained from the first interference fringe, and only information about the thickness of the thin film is obtained. Further, a phase is determined from the second interference fringe, and information about the surface of the thin film, including information about the thickness of the thin film is obtained. Further, by using the thin film thickness information, information about the surface profile of the thin film is acquired from the thin film surface information including the thin film thickness information. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006138854(A) 申请公布日期 2006.06.01
申请号 JP20050326722 申请日期 2005.11.10
申请人 KOREA ADVANCED INST OF SCIENCE & TECHNOL 发明人 KIM SEUNG WOO;GHIM YOUNG SIK
分类号 G01B11/06;G01B11/24 主分类号 G01B11/06
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