| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate treatment device having a mechanism for transferring a substrate from a substrate horizontally carrying means to a rotary substrate treatment unit wherein a dust generating possibility is eliminated, and no faultiness is generated even if performing wet-mode treatment, and further, its structure is simple, and moreover, its foot print is also comparably small. SOLUTION: The substrate treatment device has a rotary substrate treatment unit 10 and a roller conveyer 16, and also, has a carrier plate 20 so disposed that it is opposed to the terminating portion of the carrying path of the roller conveyer and that the height of the substrate supporting surface of a free roller 28 for supporting a substrate W is made identical with the height of the substrate carrying surface of the roller conveyer, further, has a transferring arm 32 for moving the substrate horizontally from the terminating portion of the carrying path of the roller conveyer to the carrier plate, and moreover, has a supporting/moving mechanism for moving the carrier plate supporting the substrate from a substrate delivering position A to a rotary supportive circular plate 12 of the rotary substrate treatment unit. Furthermore, the rotary supportive circular plate has supporting pins 44, 46 for supporting the mounting surface of the carrier plate and the substrate. COPYRIGHT: (C)2006,JPO&NCIPI
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