发明名称 MULTIPLE SHADOW MASK STRUCTURE FOR DEPOSITION SHADOW MASK PROTECTION AND METHOD OF MAKING AND USING SAME
摘要 <p>The present invention is a multi-layer shadow mask and method of use thereof. The multi-layer shadow mask includes a sacrificial mask bonded to a deposition mask. The sacrificial mask provides protection against an accumulation of evaporant on the deposition mask which would cause the deposition mask to deform.</p>
申请公布号 WO2006058081(A2) 申请公布日期 2006.06.01
申请号 WO2005US42468 申请日期 2005.11.22
申请人 ADVANTECH GLOBAL, LTD.;CONRAD, JEFFREY, W. 发明人 CONRAD, JEFFREY, W.
分类号 H01L21/3205 主分类号 H01L21/3205
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