| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide: a pattern forming material having high sensitivity and a uniform thickness of a photosensitive layer, a pattern shape excellent in planarity after pattern formation, and excellent adhesion to a base substance such as a substrate for printed wiring formation; and a pattern forming material providing a good pattern shape after pattern formation, and also to provide a pattern forming apparatus with the pattern forming material, and a pattern forming method using the pattern forming material. <P>SOLUTION: The pattern forming material has at least a photosensitive layer on a support, wherein the photosensitive layer contains a chain transfer compound having a plurality of substituents to chain transfer, a polymerization inhibitor, a binder, a polymerizable compound and a photopolymerization initiator. The pattern forming apparatus has the pattern forming material. The pattern forming method includes exposing the pattern forming material. The sensitivity of the pattern forming material is further enhanced by using a chain transfer compound having a plurality of mercapto groups as the substituents to chain transfer. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
