| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a lithographic apparatus capable of keeping the optical element of a projection system in wet condition during substrate replacement, and to provide a device manufacturing method. <P>SOLUTION: For example, a closing member 30 is used to receive liquid in a liquid confinement structure 12 while the substrate is replaced on a substrate table WT2 in an immersion lithographic apparatus. For example, a closing member displacement mechanism using a combination of one or more leaf springs and one or more electromagnets, or a combination of one or more actuators and one more pins, or a pressure source, is employed to move the member 30 to or from the structure 12. An adjustment plate is used to compensate the varying thickness of the closing member in a closing member receptacle of varying depth on different substrates. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
