| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a cata-dioptric projection system where the distance between a first object (reticle) and a second object (wafer) (distance between object images) is shortened, and excellent imaging performance can be stably attained, to provide an exposing device having the cata-dioptric projection system, and to provide a method for producing a device. <P>SOLUTION: The cata-dioptric projection system, in which the intermediate images of the first object are formed for a plurality of times, and are imaged on the second object, comprises: at least two deflection reflecting members; and a lens group arranged in an optical path between the above two deflection reflecting members, not forming reciprocating optical system through which incident light and reflected light pass and having negative refracting power. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
