发明名称 LAYOUT VERIFICATION METHOD AND DESIGN METHOD OF SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE USING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a layout verification method for a semiconductor integrated circuit device capable of detecting correctly a damage which a gate receives, and to provide a design method for the semiconductor integrated circuit device which enhances more sufficient workability and higher reliability, by determining the directivity for a design modification so as to avoid a plasma charging damage while detecting correctly the damage which the gate receives. SOLUTION: The layout verification method can output an antenna value as an estimated value of the transistor gate damage on the basis of the antenna rate and the change rate of a plasma charging damage caused by the layout in the vicinity of the transistor gate. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006140349(A) 申请公布日期 2006.06.01
申请号 JP20040329421 申请日期 2004.11.12
申请人 MATSUSHITA ELECTRIC IND CO LTD 发明人 ITO MASANORI;MUKAI KIYOSHI
分类号 H01L21/82;H01L21/822;H01L27/04 主分类号 H01L21/82
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