发明名称 Methods of forming conductive elements using organometallic layers and flowable, curable conductive materials
摘要 A conductive element is formed on a substrate by forming an organometallic layer on at least a portion of a surface of the substrate, heating a portion of the organometallic layer, and removing an unheated portion of the organometallic layer. In other methods, a flowable, uncured conductive material may be deposited on a surface of the substrate, the flowable, uncured conductive material may be selectively cured over at least a portion of the surface of the substrate, and a portion of the cured conductive material may be removed. A conductive via is formed by forming a hole at least partially through a thickness of a substrate, depositing an organometallic material within at least a portion of the hole, and selectively heating at least a portion of the organometallic material.
申请公布号 US2006115926(A1) 申请公布日期 2006.06.01
申请号 US20060336540 申请日期 2006.01.20
申请人 WOOD ALAN G;FARNWORTH WARREN M;WATKINS CHARLES M;BENSON PETER A 发明人 WOOD ALAN G.;FARNWORTH WARREN M.;WATKINS CHARLES M.;BENSON PETER A.
分类号 H01L21/50 主分类号 H01L21/50
代理机构 代理人
主权项
地址