| 摘要 |
<p>A stage apparatus for placing substrates such as wafer etc. and an exposure apparatus having the stage apparatus, in which positioning accuracy of a substrate that is sucked by a chuck is easily enhanced and separation of the substrate from the chuck is facilitated. A stage apparatus in which a chuck for sucking a substrate conveyed by a conveyance means is disposed on a finely movable table, provided above a coarsely movable table, with the suction surface of the chuck faced upward. A support member is provided on the coarsely movable table and supports, when the finely movable table is in a lowered position, the substrate above the chuck in a manner separated from the chuck.</p> |
