| 摘要 |
<P>PROBLEM TO BE SOLVED: To perform a high-speed measurement without increasing an entrance length although a measuring sensor is meandered on a substrate to perform equi-spaced measurements in the uniform motion component, and a high-speed movement is required to shorten measuring time which inevitably requires a long entrance length and a broad space in measuring the height level of the substrate in a lithographic projection device to make a map. <P>SOLUTION: The high-speed measurement is achieved by selecting a measured orbit in which relative movement of a measuring system MS and the substrate 4 is performed along predetermined measuring points, selecting accelerations and speeds of the correlated measuring system MS and substrate 4 as the functions of time, determining the timings of measured samples so as to take these measured samples at these predetermined points, and taking at least one measurement sample at a point at which the substrate 4 and measuring system MS are accelerated in a correlated manner, thereby enabling the high-speed measurement without increasing the entrance length. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
