发明名称 INTEGRATED BST MICROWAVE TUNABLE DEVICES USING BUFFER LAYER TRANSFER METHOD
摘要 A BST microwave device includes a single crystal oxide wafer. A silicon dioxide layer is formed on the single crystal oxide layer. A silicon substrate is bonded on the silicon dioxide layer. A BST layer is formed on the single crystal oxide layer.
申请公布号 WO2006034120(A3) 申请公布日期 2006.06.01
申请号 WO2005US33339 申请日期 2005.09.19
申请人 MASSACHUSETTS INSTITUTE OF TECHNOLOGY;KIM, II-DOO;TULLER, HARRY, L. 发明人 KIM, II-DOO;TULLER, HARRY, L.
分类号 H01P1/18;H01P3/00 主分类号 H01P1/18
代理机构 代理人
主权项
地址