| 摘要 |
<P>PROBLEM TO BE SOLVED: To obtain a photoresist polymer suitable for use in ArF excimer laser and more specifically a manufacturing process by which the photoresist polymer having a stable quality is efficiently produced. <P>SOLUTION: The photoresist polymer has a structure which is decomposed at least by an acid and becomes alkali-soluble and an alicyclic hydrocarbon group containing a polar group adhering to semiconductor substrates. The manufacturing process therefor comprises copolymerizing a monomer with a polymerization initiator, adding the polymerization solution to a poor solvent and obtaining the precipitated polymer by removing the unreacted monomer by decantation without filtration. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
