| 摘要 |
PROBLEM TO BE SOLVED: To provide a plasma CVD apparatus which uniformizes a thickness distribution of a deposited film on a substrate to be treated and improves reproducibility for the thickness distribution of the deposited film on the substrate to be treated, by preventing overdischarge from occurring. SOLUTION: This plasma CVD apparatus has an insulating part made from an electrically insulating material arranged around a peripheral part 61 of a second electrode 5. Accordingly, the apparatus does not generate overdischarge even when repeatedly used, which uniformizes a thickness distribution of the deposited film on the substrate to be treated 2; and thereby prevents a particle from forming on the deposited film, which improves the reproducibility for the thickness distribution of the deposited film on the substrate to be treated 2. COPYRIGHT: (C)2006,JPO&NCIPI |
