发明名称 SCANNING ELECTRON MICROSCOPE AND SEMICONDUCTOR INSPECTING SYSTEM
摘要 PROBLEM TO BE SOLVED: To enhance the image quality of an image photographed by scanning electron microscope. SOLUTION: In this scanning electron microscope equipped with an electron source 101 for irradiating a primary electron beam 108 on sample wafer 106, an accelerating electrode 102, a focusing lens 103, a deflector 104, an objective lens 105 or the like, a detector 110 to acquire a digital image by sampling an emitted electron signal 109 generated from the sample wafer 106, a digitalizing means 111 or the like, an image memory 116 for storing, displaying, and processing the acquired digital image, an input and output part 118, an image forming part 115, and an image processing part 114 or the like, a sampling means for sampling the discharged electron signal 109 at intervals that are finer than the pixel size of the memorized, displayed or processed digital image, and an image formation processing means for forming the digital image, by enlarging the pixel size based on the sampled discharge electron signal 109 are provided. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006139965(A) 申请公布日期 2006.06.01
申请号 JP20040326924 申请日期 2004.11.10
申请人 HITACHI HIGH-TECHNOLOGIES CORP 发明人 NAKAGAKI AKIRA;HONDA TOSHIFUMI
分类号 H01J37/22;G01B15/00;G01N23/225;H01J37/28;H01L21/66 主分类号 H01J37/22
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