发明名称 |
Method for patterning thin film, method and apparatus for fabricating flat panel display |
摘要 |
Disclosed is a method and apparatus for fabricating a patterned thin film layer within a flat panel display that employs a soft mold and heat treatment in place of a photolithographic process. The disclosed method may reduce process time as well as substantially minimize pattern deformities. A method of fabricating a thin film, a method and apparatus of fabricating a flat panel display according to an embodiment of the present invention includes the steps of forming a thin film on a substrate; coating an etch-resist solution including solvent over a substrate where the thin film has been formed; aligning a soft mold on the substrate provided with the etch-resist solution; forming a patterned etch-resist layer on the thin film by forming the etch-resist solution through a first heat treatment below the vaporization temperature of the solvent while pressure is applied to the soft mold on the etch-resist solvent; separating the soft mold from the patterned etch-resist layer; solidifying the patterned etch-resist layer through a second heat treatment; and etching the thin film by using the patterned etch-resist layer as a mask.
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申请公布号 |
US2006115997(A1) |
申请公布日期 |
2006.06.01 |
申请号 |
US20040973984 |
申请日期 |
2004.10.27 |
申请人 |
KIM YONG B;KIM JIN W |
发明人 |
KIM YONG B.;KIM JIN W. |
分类号 |
H01L21/027;H01L21/31;G02F1/13;G02F1/136;G03F7/00;G09F9/00;H01L21/00;H01L21/469;H01L51/00;H01L51/56 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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