发明名称 |
Photocuring of radiation-curable compositions under inert gas |
摘要 |
A process is described for producing molding compounds and coatings on substrates by curing radiation-curable compositions under inert gas by exposure to light wherein said inert gas comprises a gas heavier than air, and lateral escape of the inert gas in the course of radiation curing is prevented by means of appropriate apparatus or other measures.
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申请公布号 |
US2006115602(A1) |
申请公布日期 |
2006.06.01 |
申请号 |
US20060324559 |
申请日期 |
2006.01.04 |
申请人 |
BASF AKIENGESELLSCHAFT |
发明人 |
BECK ERICH;DEIS OLIVER;ENENKEL PETER;SCHROF WOLFGANG |
分类号 |
B05D3/00;B05D7/24;B05D3/04;B05D3/06;F26B3/28;F26B21/14 |
主分类号 |
B05D3/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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