发明名称 Photocuring of radiation-curable compositions under inert gas
摘要 A process is described for producing molding compounds and coatings on substrates by curing radiation-curable compositions under inert gas by exposure to light wherein said inert gas comprises a gas heavier than air, and lateral escape of the inert gas in the course of radiation curing is prevented by means of appropriate apparatus or other measures.
申请公布号 US2006115602(A1) 申请公布日期 2006.06.01
申请号 US20060324559 申请日期 2006.01.04
申请人 BASF AKIENGESELLSCHAFT 发明人 BECK ERICH;DEIS OLIVER;ENENKEL PETER;SCHROF WOLFGANG
分类号 B05D3/00;B05D7/24;B05D3/04;B05D3/06;F26B3/28;F26B21/14 主分类号 B05D3/00
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