发明名称 |
MULTI-TRAY FILM PRECURSOR EVAPORATION SYSTEM AND THIN FILM DEPOSITION SYSTEM INCORPORATING SAME |
摘要 |
<p>A high conductance, multi-tray solid precursor evaporation system (50, 150, 300, 300') coupled with a high conductance vapor delivery system (40, 140) is described for increasing deposition rate by increasing exposed surface area of solid precursor (350). The multi-tray solid precursor evaporation system (50, 150, 300, 300') includes a base tray (330) with one or more upper trays (340). Each tray (330, 340) is configured to support and retain film precursor (350) in, for example, solid powder form or solid tablet form. Additionally, each tray (330, 340) is configured to provide for a high conductance flow of carrier gas over the film precursor (350) while the film precursor (350) is heated. For example, the carrier gas flows inward over the film precursor (350), and vertically upward through a flow channel (318) within the stackable trays (340) and through an outlet (322) in the solid precursor evaporation system (50, 150, 300, 300').</p> |
申请公布号 |
WO2006058310(A1) |
申请公布日期 |
2006.06.01 |
申请号 |
WO2005US43018 |
申请日期 |
2005.11.29 |
申请人 |
TOKYO ELECTRON LIMITED;TOKYO ELECTRON AMERICA, INC.;SUZUKI, KENJI;GUIDOTTI, EMMANUEL, P.;LEUSINK, GERRIT, J.;HARA, MASAMICHI;KUROIWA, DAISUKE |
发明人 |
SUZUKI, KENJI;GUIDOTTI, EMMANUEL, P.;LEUSINK, GERRIT, J.;HARA, MASAMICHI;KUROIWA, DAISUKE |
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