发明名称 METHOD FOR FORMING THIN FILM, DEPOSITION SOURCE SUBSTRATE AND METHOD FOR PRODUCING THE SAME
摘要 <p>A method for forming a thin film on a substrate through a simple configuration. In the method, a thin film (12) is formed on the thin film forming surface (11) of a substrate (10) by depositing a film material (23) thereon. The film forming surface (11) of the substrate (10) is arranged in proximity and oppositely to the material supply surface (21) of a supply substrate (20) carrying the film material (23). A recess (22) is formed on the material supply surface (21) in mirror pattern of a desired pattern and the film material (23) is arranged in the recess (22). The recess (22) forms a substantially enclosed space with the thin film forming surface (11). When the film material (23) in the recess (22) is evaporated, evaporated matters of the film material (23) are transported to each opposing region on the opposing thin film forming surface (11). Consequently, a thin film (12) is deposited on the thin film forming surface (11).</p>
申请公布号 WO2006057353(A1) 申请公布日期 2006.06.01
申请号 WO2005JP21718 申请日期 2005.11.25
申请人 KYOTO UNIVERSITY;PIONEER CORPORATION;NIPPON TELEGRAPH AND TELEPHONE CORPORATION;MITSUBISHI CHEMICAL CORPORATION;ISHIDA, KENJI;KINBARA, HIDEYASU;MATSUSHIGE, KAZUMI;SHIMOJI, NORIYUKI 发明人 ISHIDA, KENJI;KINBARA, HIDEYASU;MATSUSHIGE, KAZUMI;SHIMOJI, NORIYUKI
分类号 H01L29/786;C23C14/24;C23C14/04;H01L21/336;H01L21/363;H01L51/05 主分类号 H01L29/786
代理机构 代理人
主权项
地址