发明名称 |
PATTERN PLOTTING DEVICE AND PATTERN PLOTTING METHOD |
摘要 |
In a pattern writing method for writing a pattern on a substrate by the use of projection patterns output from a mirror device including two-dimensionally arranged micromirrors, exposure is implemented by ON/OFF controlling each micromirror and partly overlapping the projection patterns from the mirror device at least in a one-dimensional direction, thereby accurately controlling the exposure of intermediate amounts of light.
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申请公布号 |
EP1662552(A1) |
申请公布日期 |
2006.05.31 |
申请号 |
EP20040726740 |
申请日期 |
2004.04.09 |
申请人 |
BALL SEMICONDUCTOR INC.;OHMI, TADAHIRO |
发明人 |
OHMI, TADAHIRO;SUGAWA, SHIGETOSHI;YANAGIDA, KIMIO;TAKEHISA, KIWAMU |
分类号 |
G03F7/20;(IPC1-7):H01L21/027 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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