Method of detecting position of mark on substrate, position detection apparatus using this method, and exposure apparatus using this position detection apparatus

摘要

In an exposure apparatus and method, an object is exposed through a projection optical system with an exposure beam irradiated on a mask. An illumination system illuminates a mark on the object and a detecting system detects the illuminated mark. Various illumination and exposure wavelengths are used. The mark is moved relative to illumination beams to enable determining positional information of the mark.