发明名称 Method of manufacturing photovoltaic device
摘要 The present invention provides a method for manufacturing integrated-type photovoltaic devices wherein light is incident from a side opposite to its substrate. The advantage of the method is easy patterning. A first electrode film, a photoelectric conversion layer, and a second electrode film are laminated on an insulating layer of a substrate without separation to form a laminated film. A deep open groove is formed through the laminated film to the depth of the first electrode film so as to electrically separate the laminated film including the first electrode film. Two shallow open grooves are formed parallel with, but slightly away from the deep open groove, and separate the laminated film upto the second electrode film. The second electrode film having three or more open grooves are used as a mask to remove the photoelectric conversion layer by etching to expose the first electrode film at bottoms of at least one shallow open groove. An insulating member is formed by filling up the deep open groove where the first electrode film is exposed at the bottom of the groove. A conductive member extends over adjacent elements across the deep open groove.
申请公布号 US7052998(B2) 申请公布日期 2006.05.30
申请号 US20040947297 申请日期 2004.09.23
申请人 SANYO ELECTRIC CO., LTD. 发明人 SHINOHARA WATARU
分类号 H01L21/3065;H01L21/311;H01L21/205;H01L21/302;H01L21/461;H01L31/00;H01L31/04;H01L31/18 主分类号 H01L21/3065
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