发明名称 Monitoring method, process and system for photoresist regeneration
摘要 A monitoring method for photoresist regeneration, a process and a system for the same are provided. In the photoresist regeneration process of the invention, the solid content and viscosity of photoresist are adjusted by condensation under reduced pressure or dilution with photoresist thinner until the final solid content and viscosity reach the predetermined values thereof obtained through the quantification equation of the invention and then the waste photoresist is caused to pass through filters for removing pollution particles contained therein, such that the regenerated photoresist is acquired.
申请公布号 US7052826(B2) 申请公布日期 2006.05.30
申请号 US20040918483 申请日期 2004.08.16
申请人 INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE 发明人 LAI CHING CHIN;CHANG FANG CHENG;CHEN MING EN;CHU JUNG HSIANG;HSAIO KUANG LING;JANG YUN LIN
分类号 G03C1/492;G03F7/26;G03F7/00;G03F7/42;H01L21/02;H01L21/027 主分类号 G03C1/492
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