发明名称 Semiconductor device and method of manufacturing the same
摘要 Problems in prior art regarding an n-channel TFT in the source / drain gettering method are solved. In the n-channel TFT, its source / drain regions contain only an n-type impurity. Therefore, compared to a p-channel TFT whose source / drain regions contain an n-type impurity and a higher concentration of p-type impurity, the gettering efficiency is inferior in a channel region of the n-channel transistor. Accordingly, the problem of inferior gettering efficiency in the n-channel TFT can be solved by providing at an end of its source / drain regions a highly efficient gettering region that contains an n-type impurity and a p-type impurity both with the concentration of the p-type impurity set higher than the concentration of the n-type impurity. <IMAGE>
申请公布号 SG121715(A1) 申请公布日期 2006.05.26
申请号 SG20020003262 申请日期 2002.05.31
申请人 SEMICONDUCTOR ENERGY LABORATORY CO., LTD.;SHARP KABUSHIKI KAISHA 发明人
分类号 G02F1/1368;H01L21/20;H01L21/322;H01L21/336;H01L21/77;H01L27/08;H01L29/786 主分类号 G02F1/1368
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