| 摘要 |
In a method for preparing a silicon monoxide vapor deposition material wherein a mixture of a silicon powder and a silicon dioxide powder is heated and reacted in a raw material chamber under vacuum to generate a silicon monoxide gas and silicon monoxide is precipitated on a precipitation substrate in a precipitation chamber provided above the raw material chamber, an improvement which comprises using, as the precipitation substrate, a cylindrical body wherein a circumference wall is inclined from the perpendicular by 1 to 45 degrees and the inner diameter of the upper end thereof is smaller than that of the lower end, and effecting the precipitation under a vacuum of 7 Pa to 40 Pa. The method allows the preparation of a silicon monoxide vapor deposition material exhibiting a weight reduction rate in the rattler test (a rattler value) of 1.0 % or less and being reduced in the occurrence of the splash phenomenon during the formation of a silicon monoxide vapor deposition film. <IMAGE> |
