Reference mask having at least a reference pattern for creating a defect recognition level, method of fabricating the same, method of creating a defect recognition level using the same and method of inspecting defects using the same,申请号KR20030046181-传众专利搜索

发明名称	Reference mask having at least a reference pattern for creating a defect recognition level, method of fabricating the same, method of creating a defect recognition level using the same and method of inspecting defects using the same
摘要
申请公布号	KR100583950(B1)	申请公布日期	2006.05.26
申请号	KR20030046181	申请日期	2003.07.08
申请人		发明人
分类号	H01L21/027;G01N21/95;G03F1/00	主分类号	H01L21/027
代理机构		代理人
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