Method of forming a tungsten contact in a semiconductor device and equipment of forming a tungsten contact,申请号KR20030057264-传众专利搜索

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发明名称	Method of forming a tungsten contact in a semiconductor device and equipment of forming a tungsten contact
摘要
申请公布号	KR100583637(B1)	申请公布日期	2006.05.26
申请号	KR20030057264	申请日期	2003.08.19
申请人		发明人
分类号	H01L21/28;H01L21/285;H01L21/44;H01L21/768	主分类号	H01L21/28
代理机构		代理人
主权项
地址

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