DRY ETCHING APPARATUSES AND METHODS OF FORMING AN ELECTRIC DEVICE USING THE SAME

摘要

Provided are dry etching apparatuses and dry etching end point detecting apparatuses used in a Bosch process, and methods of forming electric devices using the dry etching apparatuses. The dry etching apparatuses, dry etching end point detecting apparatuses and methods of forming electric devices using the dry etching apparatuses provide a technique of separating plasma light having etching information of a substrate while etching and deposition processes are repeatedly performed, and efficiently fabricating an electric device. To this end, a process chamber is prepared. An optical window is disposed on a sidewall of the process chamber. The optical window projects the plasma light out of the process chamber during the etching and deposition processes of the Bosch process. An optical condenser is disposed around the optical window. The optical condenser captures the plasma light in the etching or deposition process. An optical analyzer connected electrically to the optical condenser is disposed. The optical analyzer analyzes the plasma light, and converts the plasma light nto optical image.