发明名称 Centralized control architecture for a plasma arc system
摘要 Apparatus, systems, and methods for monitoring the processing of a workpiece that includes directing an incident laser beam onto the workpiece and using an optical detector for measuring a signal emitted from the workpiece as a result of the incident laser beam. The detector generates at least two signals based upon the optical signal. The method also involves use of a light source monitor in determining workpiece processing quality based upon the quotient of the two outputs as well as a magnitude of one of the two quotients.
申请公布号 US2006108333(A1) 申请公布日期 2006.05.25
申请号 US20050323006 申请日期 2005.12.30
申请人 发明人 PICARD TATE S.;WOODS KENNETH J.;YOUNG ROGER E.JR.;CONNALLY WILLIAM J.
分类号 B23K26/00 主分类号 B23K26/00
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