发明名称 System and method for forming well-defined periodic patterns using achromatic interference lithography
摘要 A beam, from a short-coherence-length source, is split and recombined by diffraction gratings not necessarily equal in spatial period. The recombining beams overlap and expose a common area on a substrate. The exposed area on the substrate is defined or shaped by at least one aperture in the beam paths. After exposure of one shaped area, relative translation between components permits exposure of another shaped area on the substrate. Additionally or alternatively, by introducing either rotation or translation between components during each exposure, the exposed area is made larger than the original shaped area.
申请公布号 US2006109532(A1) 申请公布日期 2006.05.25
申请号 US20040993529 申请日期 2004.11.19
申请人 SAVAS TIMOTHY A;SMITH HENRY I 发明人 SAVAS TIMOTHY A.;SMITH HENRY I.
分类号 G03H1/10 主分类号 G03H1/10
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