发明名称 PLASMA REACTOR AND PLASMA REACTION APPARATUS
摘要 <P>PROBLEM TO BE SOLVED: To provide a plasma reactor constituted so as to satisfy all of discharge stability, the voltage rising ratio of a pulse electric field, the reaction efficiency of gas, the expansiblity (stackability) of a system, controllability corresponding to the kind of gas and the like to be made adaptable to various plasma treatments. <P>SOLUTION: The plasma reactor has a container 20, one electrode plate 24 arranged in the container 20 and having one through-hole 22 and one linear electrode 26 arranged so as to be inserted in the through-hole 22. The container 20 has a front part 28, a back part 30 and four side walls 21 and a frame-shaped dielectric block 23 is interposed between the end surfaces of the side plate parts 28b of the front part 28 and the end surfaces of the side walls 21 while a frame-shaped dielectric block 25 is also interposed between the end surfaces of the side plate parts 30b of the back part 30 and the end surfaces of the side walls 21. The front part 28, the back part 30 and a pulse power supply 12 are electrically connected and the side walls 21 of the container 20 and the electrode plate 24 are earthed [connected to GND (ground)]. <P>COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006130399(A) 申请公布日期 2006.05.25
申请号 JP20040321771 申请日期 2004.11.05
申请人 NGK INSULATORS LTD 发明人 IMANISHI YUICHIRO
分类号 B01J19/08;B01D53/38;B01D53/56;B01D53/74;H05H1/24 主分类号 B01J19/08
代理机构 代理人
主权项
地址