发明名称 MAGNETORESISTANCE EFFECT ELEMENT
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a method which can manufacture a magnetoresistance effect element having a high MR rate of change without increasing an area resistance RA largely. <P>SOLUTION: The magnetic resistance effect element includes a fixed magnetization layer whose magnetization direction is substantially fixed to one direction, a free magnetization layer whose magnetization direction changes according to an external field, and a spacer layer which contains an insulating layer located between the fixed magnetization layer and the free magnetization layer and a current path passing through the insulating layer. The fixed magnetization layer or the free magnetization layer positioned on the underside of the spacer layer contains crystal grains separated by a grain boundary extending in the direction of thickness. When the in-plane direction position of one end of the crystal grain is 0, and the in-plane direction position of the grain boundary adjacent to another end of the crystal grain is 100; the current path is formed on an area where the in-plane direction position is 20 to 80. <P>COPYRIGHT: (C)2006,JPO&NCIPI</p>
申请公布号 JP2006135253(A) 申请公布日期 2006.05.25
申请号 JP20040325315 申请日期 2004.11.09
申请人 TOSHIBA CORP 发明人 FUKUZAWA HIDEAKI;YUASA HIROMI;KOUI KATSUHIKO;IWASAKI HITOSHI
分类号 H01L43/08;G11B5/39;H01F10/30;H01F10/32;H01F41/18;H01F41/20;H01F41/32;H01L21/8246;H01L27/105 主分类号 H01L43/08
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