| 摘要 |
PROBLEM TO BE SOLVED: To provide an alignment mark which can be detected in a relatively short time even under such a situation as the alignment mark is deviated from a recognition region, and to provide its detection method. SOLUTION: The alignment mark 1 has a main pattern 1m being used for detecting a position, and a plurality of subpatterns 1s provided around the main pattern 1m in proximity thereto. The subpatterns 1s has a profile different from that of the main pattern 1m and the interval between the main pattern 1m and the subpattern 1s is set such that at least one subpattern 1s is located in a recognition region when the main pattern 1m is located on the outside of the recognition region due to positional shift so that a charged beam can be focused by the subpattern 1s. Consequently, shutdown of a measuring SEM due to error can be avoided and the position can be detected in a relatively short time. COPYRIGHT: (C)2006,JPO&NCIPI
|
