发明名称 Bipolar transistor and a method of fabricating said transistor
摘要 The invention proposes a bipolar transistor comprising a substrate, emitter, base, and collector layers and, if appropriate, contact layers. The base layer is formed from a GaAsSb material. The transistor also has at least one transition layer formed from a GaInP material between the emitter layer and the base layer. The presence and composition of the transition layer allows the profile of the conduction band of the transistor to be shaped to optimize performance. Further, the composition of the transition layer facilitates fabrication of the transistor by selective etching. The invention also relates to a circuit comprising a bipolar transistor of the invention. The invention also proposes a method of fabricating a transistor in accordance with the invention.
申请公布号 US2006108604(A1) 申请公布日期 2006.05.25
申请号 US20050280261 申请日期 2005.11.17
申请人 ALCATEL 发明人 BLAYAC SYLVAIN;SCAVENNEC ANDRE
分类号 H01L29/739 主分类号 H01L29/739
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