FLUORINE-CONTAINING COPOLYMER, ITS MANUFACTURING METHOD AND RESIST COMPOSITION CONTAINING IT

摘要

PROBLEM TO BE SOLVED: To provide a resist composition having a high concentration of a functional group and high transparency at a wide range of a wave length.

SOLUTION: This composition comprises a copolymer containing a monomer represented by formula (1), wherein Y represents H, F or a hydroxy group, R1represents H, a methyl group, F or a trifluoromethyl group, X represents H or F, and one or more X represents F.

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