| 摘要 |
PROBLEM TO BE SOLVED: To provide a semiconductor manufacturing apparatus and method for executing the temporal tracking of a progress level of oxidation reaction, and for properly controlling the oxidation reaction. SOLUTION: The rays of light are emitted from a white light source 14 to a semiconductor precursor 12 in an oxidation furnace 10; the reflected rays of the light from the semiconductor precursor 12 in the oxidation reaction are detected by a reflected rays of light-detecting means 16; the reflection factor, the mean reflection factor, the change rate of the reflection factor or the rate of change of the mean reflection factor are calculated by a computer 18, based on the detected reflected rays of light; the arithmetic result is displayed on a monitor 20; the oxidation reaction is controlled, based on the arithmetic result; and a portion of the oxidation validating region of the semiconductor precursor 12 is selectively oxidized and a semiconductor can be manufactured. COPYRIGHT: (C)2006,JPO&NCIPI
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