| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an immersion-type exposure device capable of inhibiting the adhesion, deposition or the like of foreign matters in a groove formed on a holding base. <P>SOLUTION: The immersion-type exposure device has (A) a lens opposed to an object to be exposed, (B) a shower head 10 for filling a section between the lens, on which a liquid-supply line 12 and a liquid-discharge line 13 are mounted, and the object to be exposed with a liquid, and (C) the holding base 21 for holding the object to be exposed. The immersion-type exposure device further has (D) the groove 26 formed on the holding base so as to correspond to the periphery of the object to be exposed, (E) a liquid discharge opening 27 formed to the groove 26, and (F) a cleaning-liquid supply means 28 for supplying the groove 26 with a washing liquid. The supplied washing liquid is discharged from the liquid-discharge opening 27. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
