| 摘要 |
<P>PROBLEM TO BE SOLVED: To suppress decrease in the quality of an exposure pattern to be image-formed on a photosensitive material in an exposure apparatus. <P>SOLUTION: A spatial light modulator 80 is used, the modulator including a modulation element array unit 81 comprising a large number of two-dimensionally arranged modulation elements 82 to modulate light Le at a wavelength in a UV region or violet region emitted from a light source, a light transmitting window 87 constituted of a transmitting material to transmit the light Le, and a sealing cover part 88 to seal the modulation element array unit 81 between itself and the light transmitting window 87, wherein the light transmitting window 87 receives only light irradiating a region G2 out of the exposure optical path in the surface G0 of the light transmitting window 87, and floating particles R present in a hermetically sealed space M are deposited on the region G2 out of the exposure optical path. The light Le emitted from the light source 66 and made incident through the light transmitting window 87 is reflected and spatially modulated by the modulation element array 81 to exit through the light transmitting window 87, and the exiting light Le is image-formed onto a photosensitive material to expose the photosensitive material. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
